Edge-break control and measurement

100% quality control using highly accurate, robust and fast measuring

Fig. 1: Edge break on wafer

Fig. 2: Camera with telecentric lens, back light and wafer on a conveyor

Wafer-form defined lighting guarantees optimum illumination of the edge. Telecentric measurement systems allow for high precision with regard to the edge-break control (up to 60 µm x 60 µm) and combined measurement tasks. Due to their special imaging concept they can stand up to displacement and changes in height.

Further information from our partner is available at Buchanan Systems.